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John M. Jerke

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Interlaboratory study on linewidth measurements for antireflective chromium photomasks

by John M. Jerke First published in 1982 — 2 editions

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Accurate linewidth measurement on integrated-circuit photomasks

by John M. Jerke First published in 1980 — 1 edition

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Accurate linewidth measurements on integrated-circuit photomasks

by John M. Jerke First published in 1980 — 1 edition

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Optical and dimensional-measurement problems with photomasking in microelectronics

by John M. Jerke First published in 1975 — 1 edition

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OLID: OL1338935A

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