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John L. Vossen

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Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films)

by Maurice H. Francombe and John L. Vossen First published in 1995 — 5 editions

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Physics of thin films: Advances in research and development.

by Maurice H. Francombe and John L. Vossen First published in 1992 — 5 editions

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Thin film processes II

by John L. Vossen and Werner Kern First published in 1991 — 2 editions

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Physics of thin films: advances in research and development.

by Maurice H. Francombe and John L. Vossen First published in 1991 — 2 editions

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Physics of Thin Films, Volume 17: Volume 17 (Thin Films)

by Maurice H. Francombe and John L. Vossen First published in 1993 — 2 editions

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Physics of thin films: advances in research and development.

by Maurice H. Francombe and John L. Vossen First published in 1989 — 2 editions

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Optical Characterization of Real Surfaces and Films: Advances in Research and Development

by K. Vedam, Maurice H. Francombe, and John L. Vossen First published in 2013 — 1 edition

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Mechanic and Dielectric Properties: Advances in Research and Development

by Maurice H. Francombe and John L. Vossen First published in 2016 — 1 edition

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Plasma Sources for Thin Film Deposition and Etching

by Maurice H. Francombe and John L. Vossen First published in 2013 — 1 edition

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Thin Films for Emerging Applications

by Maurice H. Francombe and John L. Vossen First published in 2016 — 1 edition

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Thin film processes

by John L. Vossen and Kern, Werner First published in 1978 — 1 edition

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Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18)

by Maurice H. Francombe and John L. Vossen First published in 1994 — 1 edition

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Advances in research and development: heterojunctions for high-speed and infrared applications

by Maurice H. Francombe and John L. Vossen First published in 1998 — 1 edition

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Physics of thin films

by Maurice H. Francombe and John L. Vossen

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OLID: OL3365381A

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