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Last edited anonymously
April 29, 2008 |
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Christopher Lyle Borst
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Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology
by
Christopher L. Borst
,
Christopher Lyle Borst
,
William N. Gill
, and
Ronald J. Gutmann
First published in 2002
4 editions
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Subjects
Chemical mechanical planarization
Chemistry - Organic
Electronics - Circuits - Integrated
Electronics - Semiconductors
Engineering - Electrical & Electronic
Grinding and polishing
Integrated Circuits
Interconnects (Integrated circ
Interconnects (Integrated circuit technology)
Plastics & polymers technology
Polishing
Science-Chemistry - Organic
Science/Mathematics
Semiconductors
Technology
Technology & Industrial Arts
Technology / Electronics / Semiconductors
Technology / Engineering / Industrial
Technology-Engineering - Electrical & Electronic
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ID Numbers
OLID: OL2945668A
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